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Nb2Ox High Purity Sputtering Targets

Product Details

Nb2Ox High Purity Sputtering Targets
Nb2Ox High Purity Sputtering Targets
Nb2Ox High Purity Sputtering Targets
Nb2Ox Developed For DC Sputtering Process
Purity:99.99%
Density:99%
Low Resistivity
High Thin Film Performance
Target Size: Rectangle upto 400mm Lenght/Disk upto 450mm Diameter/Rotatable.
Proven in large volume production environment for high power sputtering process and high deposition rate.

Contact Information

Contact PersonThomas Liu
Telephone65 6515 9138
Fax Number65 6515 9183
Websitewww.apphia.com.sg
Post Code637806
Address70 Tuas South Street 5
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